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KMID : 0385520030160050368
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Analytical Science & Technology
2003 Volume.16 No. 5 p.368 ~ p.374
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Treatment of Halogen Gases, BCl₃and CF₄, used in Semiconductor Process by Using Inorganic Gas Adsorption Agents
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임흥빈/Lim HB
황청수/박정준/Hwang CS/Park JJ
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Abstract
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KEYWORD
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